Single Port SRAM compiler - TSMC 90 nm LPeF - Memory optimized for ultra low leakage (source biasing) and high density - compiler range up to 640 k
Key Benefits
- Configuration
- SVT transistors for memory periphery
- uHD HVT Pushed rule bit cell from foundry
- Designed with 4 metal layers, routing enabled over the memory in metal 5
- Source biasing for ultra low leakage
- 4x leakage savings compared to standard stand by mode
- 30% leakage savings compared to standard retention mode without source biasing
- Smart periphery design to reach the highest density
- Up to 10% denser than standard memory generators at 90 nm
- Low dynamic power
- Partitioned array to reach ultra low power consumption
- Variable write-mask capability
- Easy integration
- MUX options
- Data range flexibility allows easy addition of bits for redundancy or ECC purposes
- Address range flexibility allows easy addition of single rows for redundancy purposes
- The Dolphin quality
- Complete mismatch validation of the memory architecture taking in account local and global dispersion
- High robustness thanks to self-timing access scheme
Performances
Variants
|
VT Bit cell
|
VT Periphery
|
Operating Voltage
|
Capacity
|
Option mode
|
---|---|---|---|---|---|
90 LP eFlash
|
HD HVT | SVT | Nominal voltage: 1.2 V +/-10% |
8kbits - 0.625Mbits | - |